CARL ZEISS SMT AG

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 3202
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 394
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1103
 
  
 
B82Y SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES152

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9910193 Reflective optical element and EUV lithography applianceOct 31, 14Mar 06, 18[B82Y, G21K, G02B, G03F]
8570486 Lithographic apparatus and device manufacturing methodApr 13, 12Oct 29, 13[G03B]
7570343 Microlithographic projection exposure apparatusNov 23, 05Aug 04, 09[G03B]
7312852 Polarized radiation in lithographic apparatus and device manufacturing methodDec 28, 04Dec 25, 07[G03B]
7265917 Replacement apparatus for an optical elementOct 15, 04Sep 04, 07[G02B]
6655808 Focusing-device for the radiation from a light sourceSep 10, 01Dec 02, 03[G02B]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2009/0050,776 APPARATUS FOR MANIPULATION OF AN OPTICAL ELEMENTAbandonedOct 07, 08Feb 26, 09[A47G]
2009/0021,830 PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEMAbandonedJun 04, 08Jan 22, 09[G02B]
2008/0316,451 CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVESAbandonedAug 26, 08Dec 25, 08[G03F]
2008/0316,452 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUSAbandonedAug 28, 08Dec 25, 08[G03G]
2008/0316,455 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUSAbandonedJul 25, 08Dec 25, 08[G02B, G03B]
2008/0291,419 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHYAbandonedAug 06, 08Nov 27, 08[G03B]
7295331 Optical element with an optical axisExpiredOct 18, 02Nov 13, 07[G02B]
7277157 Projection method including pupillary filtering and a projection lens thereforWithdrawnOct 29, 04Oct 02, 07[G03B]
2005/0190,446 Catadioptric reduction objectiveAbandonedDec 23, 04Sep 01, 05[G02B]
6552392 MOS integrated circuit with reduced ON resistanceExpiredJul 03, 01Apr 22, 03[H01L]

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